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Si Semiconductor

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Etching

Poly-Si/Amorphous-Si HBr
SiCl4
Interconnect BCl3
BBr3
CHCl3
Dielectric Fluorocarbon Compound

Ion Implantation

BF3(B Compound)
PF3
GeF4
Sb Compound

Cleaning

CH3OH
Fluorocarbon Compound

Interconnect

Seed Layer Cu-CVD HfacCu:TMVS/TMVS
(Hfac)2Cu:DMDV
Al-CVD DMAH
DMEAA
Barrier Metal TiN-CVD TiCl4
TDMAT
TDEAT
TaN-CVD Amino tantalum Compound

Interlayer Dielectric

Low-k
(Low Dielectric Constant Film)
Low-k CVD DMDMOS
Alkyl silicon compound
(High Dielectric Constant Film) BST-CVD Ba(DPM)2
Sr(DPM)2
Ti(i-OC3H7)4
SBT-CVD Sr(DPM)2
Bi(CH3)3/Solution
Ta(OC2H5)5
High-k CVD TMA
Zr[N(C2H5)2]4
Hf[N(C2H5)2]4
Ferroelectric PZT-CVD Pb(DPM)2
Zr(DPM)4
Zr(t-OC4H9)4
Ti(i-OC3H7)4
Electrode Pt(CH3)(CH3C5H4)
Ir(AcAc)3
 
 
 

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